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A Route to MoO2 film fabrication via atomic layer deposition using Mo(IV) precursor and oxygen reactant for DRAM applicationsGo to Link

Yoon, Ara; Yang, Hae Lin; Lee, Sanghoon; Lee, Seunghwan; Kim, Beomseok; Jung, Changhwa; Lim, Hanjin; Park, Jin-Seong

ArticleIssue Date2024CitationCeramics International, v.50, no.8, pp 13841 - 13848PublisherElsevier
SCOPUS
Designing Robust Interfaces of HZO Module (>1012 at 85 °c) with High Sensing Margin (>300 mV) for ≤1.1 V 1T-1F with Common Plate Line and 1T-nF FeRAMGo to Link

Jeon, Intak; Lim, Hanjin; Kim, Seon-yong; Kim, Jin-soak; Ahn, Sehyoung; Jung, Changhwa; Kwon, Daewoong; Kwon, Hyucknam; Park, Sung-Wook

ArticleIssue Date2025CitationDigest of Technical Papers - Symposium on VLSI Technology, pp 1 - 3
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