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COMPARISON TO EFFICACY AND TOLERABILITY OF PEGINTERFERON ALFA-2A OR ALFA-2B PLUS RIBAVIRIN IN THE TREATMENT OF CHRONIC HEPATITIS C (CHC) IN KOREA: IN KYEONGGI-INCHEON PROVINCE, PEGINTERFERON EFFECTS ON CHC TREATMENT (KIPECT) STUDYGo to Link

Jeong, Juhong; Lee, Jin-Woo; Lee, Jung Il; Kim, Young Soo; Park, Sang Hoon; Park, Choong Kee N.; Kim, Young Seok; Jeong, Sook-Hyang; Kim, Yunsoo; Kim, Ju Hyun, et al.

ConferenceIssue Date2011Citation62nd Annual Meeting of the American-Association-for-the-Study-of-Liver-Diseases (AASLD), pp.850APublisherWILEYPlaceUS; San Francisco, CA
SCIESCOPUS
Improving etchability and imaging performance of EUV mask absorber materials via ion implantationGo to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Bom-Sok; Kim, Myung-Jin; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2026CitationApplied Physics A: Materials Science and Processing, v.132, no.4, pp 1 - 8PublisherSpringer Science and Business Media Deutschland GmbH
SCIESCOPUS
Improving etchability and imaging performance of EUV mask absorber materials via ion implantation (Vol 132, 245, 2026)Go to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Bom-Sok; Kim, Myung-Jin; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2026CitationAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.132, no.5, pp 1 - 1PublisherSPRINGER HEIDELBERG
SCOPUS
Improving Etchability of Challenging Materials through the Ion Implantation Process

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Myung-Jin; Kim, Bom-Sok; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13215, pp 1 - 6PublisherSPIE
SCIESCOPUS
Platinum-based alloy absorber with improved etching properties for next-generation EUV maskGo to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Ahn, Jinho

ArticleIssue Date2023CitationProceedings of SPIE - The International Society for Optical Engineering, v.12750, pp 1 - 6PublisherSPIE
SCIESCOPUS
Pt-W alloy absorbers for high-NA EUV lithography: tunable optical and etching performanceGo to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2025CitationNanotechnology, v.36, no.35, pp 1 - 7PublisherInstitute of Physics Publishing
SCIESCOPUS
Remote plasma atomic layer deposition of HfO2 thin films using the alkoxide precursor Hf(mp)(4)Go to Link

Kim, Seokhoon; Kim, Jinwoo; Choi, Jihoon; Kang, Hyunseok; Jeon, yeongtag; Cho, Wontae; An, Ki-Seok; Chung, Taek-Mo; Kim, Yunsoo; Bae, Choelhwyi

ArticleIssue Date2006CitationElectrochemical and Solid-State Letters, v.9, no.6, pp G200 - G203PublisherElectrochemical Society, Inc.
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