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Design of an Atomic Layer-Deposited In<sub>2</sub>O<sub>3</sub>/Ga<sub>2</sub>O<sub>3</sub> Channel Structure for High-Performance Thin-Film TransistorsGo to Link

Hur, Jae Seok; Jeong, Joo Hee; Kim, Gwang-Bok; Yoon, Seong Hun; Koh, Jihyun; Kuh, Bong Jin; Jeong, Jae Kyeong

ArticleIssue Date2025CitationACS Applied Materials & Interfaces, v.17, no.4, pp 6541 - 6549PublisherAmerican Chemical Society
SCIESCOPUS
Highly Robust Atomic Layer Deposition-Indium Gallium Zinc Oxide Thin-Film Transistors with Hybrid Gate Insulator Fabricated via Two-Step Atomic Layer Process for High-Density Integrated All-Oxide Vertical Complementary Metal-Oxide-Semiconductor ApplicationsGo to Linkopen access

김동규; Choi, Su-Hwan; 이원범; 정경민; Koh, Jihyun; Lee, Seunghee; Kuh, Bongjin; Park, Jin-Seong

ArticleIssue Date2024CitationSmall Structures, v.5, no.2, pp 1 - 11PublisherJohn Wiley and Sons Inc
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