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Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy Go to Link

Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho; Doh, Jonggul; Jeong, SeeJun

ArticleIssue Date2014CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.32, no.3, pp 1 - 6PublisherAmerican Institute of Physics

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Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography Go to Link

Kim, Jung Sik; Hong, Seongchul; Lee, Jae Uk; Lee, Seung Min; Ahn, Jinho

ArticleIssue Date2014CitationApplied Physics Express, v.7, no.9, pp 1 - 5PublisherIOP Publishing Ltd

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Carbon Contamination Analysis and Its Effect on Extreme Ultra Violet Mask Imaging Performance Using Coherent Scattering Microscopy/In-Situ Accelerated Contamination System Go to Link

Jeong, Chang Young; Lee, Sangsul; Doh, Jong Gul; Lee, Jae Uk; Cha, Han-sun; Nichols, William T.; Lee, Dong Gun; Kim, Seong Sue; Cho, Han Ku; Rah, Seung-yu, et al.

ArticleIssue Date2011CitationJournal of Nanoscience and Nanotechnology, v.11, no.7, pp 5717 - 5722PublisherAmerican Scientific Publishers

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Carbon contamination of EUV mask and its effect on CD performance Go to Link

Lee, Sangsul; Doh, Jong Gul; Lee, Jae Uk; Lee, Inhwan; Jeong, Chang Young; Lee, Dong Gun; Rah, Seung-yu; Ahn, Jinho

ArticleIssue Date2011CitationCurrent Applied Physics, v.11, no.4, pp S107 - S110PublisherThe Korean Physical Society

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Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask Go to Link

Woo, Dong Gon; Lee, Jae Uk; Hong, Seong Chul; Kim, Jung Sik; Ahn, Jinho

ArticleIssue Date2016CitationOptics Express, v.24, no.11, pp 2055 - 2062PublisherOptical Society of America

SCISCIESCOPUSKCI

Determination of the CD Performance and Carbon Contamination of an EUV Mask by Using a Coherent Scattering Microscopy/In-situ Contamination System Go to Link

Doh, Jonggul; Jeong, Chang Young; Lee, Sangsul; Lee, Jae Uk; Cha, Han-Sun; Ahn, Jinho; Lee, Dong Gun; Kim, Seong Sue; Cho, Han Ku; Rah, Seung-yu

ArticleIssue Date2010CitationJournal of the Korean Physical Society, v.57, no.6, pp 1486 - 1489Publisher한국물리학회

SCISCIESCOPUS

Evaluation of lithographic performance of extreme ultra violet mask using coherent scattering microscope Go to Link

Doh, Jonggul; Lee, Jae Uk; Ahn, Jinho; Kim, Seong-sue

ArticleIssue Date2012CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.30, no.6, pp 1 - 7PublisherAmerican Institute of Physics

SCISCIESCOPUS

Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography Go to Link

Hong, Seongchul; Kim, Jung Sik; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Ahn, Jinho

ArticleIssue Date2015CitationJournal of Nanoscience and Nanotechnology, v.15, no.11, pp 8652 - 8655PublisherAmerican Scientific Publishers

SCOPUS

Evaluation of optical properties of EUV resist underlayer Go to Link

Kim, Jung Sik; Hong, Seongchul; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Song, Hyun Min; Ahn, Jin ho

ArticleIssue Date2015CitationProceedings of SPIE - The International Society for Optical Engineering, v.9422PublisherSPIE

SCOPUS

Imaging performance of attenuated phase-shift mask using coherent scattering microscope Go to Link

Lee, Jae Uk; Jeong, SeeJun; Hong, Seong Chul; Lee, Seung Min; Ahn, Jin ho

ArticleIssue Date2014CitationProceedings of SPIE - The International Society for Optical Engineering, v.9048PublisherSPIE

SCISCIESCOPUS

Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography Go to Link

Lee, Sangsul; Lee, Inhwan; Doh, Jong Gul; Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2013CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.31, no.2, pp 1 - 6PublisherAmerican Institute of Physics

SCISCIESCOPUS

Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography Go to Link

Hong, Seongchul; Jeong, Seejun; Lee, Jae Uk; Lee, Seung Min; Ahn, Jinho

ArticleIssue Date2013CitationApplied Physics Express, v.6, no.9, pp 1 - 5PublisherIOP Publishing Ltd

SCOPUS

Stochastic resist patterning simulation using attenuated PSM for EUV Lithography Go to Link

Hong, Seongchul; Jeong, Seejun; Lee, Jae Uk; Lee, Seung Min; Kim, Jongseok; Doh, Jonggul; Ahn, Jin ho

ArticleIssue Date2013CitationProceedings of SPIE - The International Society for Optical Engineering, v.8679PublisherSPIE

SCISCIESCOPUS

Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning Go to Link

Lee, Jae Uk; Hong, Seongchul; Ahn, Jinho

ArticleIssue Date2013CitationApplied Physics Express, v.6, no.7, pp 1 - 4PublisherIOP Publishing Ltd

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Browsing by Lee, Jae UkAuthor

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