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AIMP2 accumulation in brain leads to cognitive deficits and blood secretion in Parkinson’s diseaseGo to Linkopen access

Kim, Heejeong; Shin, Jeong-Yong; Ham, Sangwoo; Kim, Ji Hun; Lee, Gum Hwa; Lee, Nae-Eung; Kim, Hee-Tae; Cho, Seok Hyun; Kim, Sangseong; Lee, Yunjong

ArticleIssue Date2024CitationJournal of Translational Medicine, v.22, no.1, pp 1 - 12PublisherBioMed Central
SCIESCOPUS
Characterization of Ru layer for capping/buffer application in EUVL maskGo to Link

Kim, Tae Geun; Lee, Seung Yoon; Kim, Chung Yong; Park, In-Sung; Kang, In-Yong; Lee, Nae-Eung; Chung, Yong-Chae; Ahn, Jinho

ArticleIssue Date2006CitationMicroelectronic Engineering, v.83, no.4-9, pp 688 - 691PublisherElsevier BV
SCIESCOPUS
Dry etching of TaN/HfO2 gate-stack structure in BCl3/Ar/O-2 inductively coupled plasmasGo to Link

Shin, Myung Hun; Park, Myoung-Sung; Lee, Nae-Eung; Kim, Jiyoung; Kim, Chung Ywong; Ahn, Jinho

ArticleIssue Date2006CitationJournal of Vacuum Science and Technology A, v.24, no.4, pp 1373 - 1379PublisherAmerican Institute of Physics
SCIESCOPUS
Effect of O-2 Gas during Inductively Coupled O-2/Cl-2 Plasma Etching of Mo and HfO2 for Gate Stack PatterningGo to Link

Jung, Ho Young; Lee, Hag Joo; Kwon, Bong Soo; Park, Jung Ho; Lee, Chiyoung; Ahn, Jinho; Lee, Jaegab; Lee, Nae-Eung

ArticleIssue Date2008CitationJapanese Journal of Applied Physics, v.47, no.8, pp 6938 - 6942PublisherIOP Publishing Ltd
SCIESCOPUS
Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)Go to Link

Jung, Helen Y.; Park, Ye-Rim; Lee, Hag Joo; Lee, Nae-Eung; Jeong, Chan-Young; Ahn, Jinho

ArticleIssue Date2009CitationThin Solid Films, v.517, no.14, pp 3938 - 3941PublisherElsevier Sequoia
SCIESCOPUS
Novel absorber stack for minimizing shadow effect in extreme ultraviolet maskGo to Link

Kim, Tae Geun; Kim, Byung Hun; Kang, In-Yong; Chung, Yong-Chae; Ahn, Jinho; Lee, Seung Yoon; Park, In-Sung; Kim, Chung Yong; Lee, Nae-Eung

ArticleIssue Date2006CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.24, no.6, pp 2820 - 2823PublisherAmerican Institute of Physics
SCIESCOPUS
Preface proceedings of the 7th International Conference on Microelectronics and Plasma Technology (ICMAP 2018), Incheon, KoreaGo to Link

Lee, Nae-Eung; Chae, Hee Yeop; Chung, Chee Won; Kim, Hyun Woo; Kim, Hyoung Sub; Kim, Ji Hyun; Kim, Jiyoung; Lee, Taeyoon; Park, In-Sung; Pu, Yi Kang, et al.

ArticleIssue Date2019CitationTHIN SOLID FILMS, v.680, pp.37 - 39PublisherELSEVIER SCIENCE SA
SCIESCOPUS
Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmasGo to Link

Jung, Helen Y.; Park, Ye Rim; Lee, Hack Joo; Lee, Nae-Eung; Jeong, Chan Young; Ahn, Jinho

ArticleIssue Date2009CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.27, no.6, pp 2361 - 2365PublisherAmerican Institute of Physics
SCIESCOPUSKCI
Study of a thin Al2O3/TaN absorber stack on Ru-capped multilayers

Kim, Tae Geun; Kim, Byung Hun; Kang, In-Yong; Chung, Yong-Chae; Ahn, Jinho; Lee, Seung Yoon; Park, In-Sung; Kim, Chung Yong; Lee, Nae-Eung

ArticleIssue Date2006CitationJournal of the Korean Physical Society, v.49, pp S721 - S725Publisher한국물리학회
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