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The Electrical Performance Difference of TFTs Using SiOx Gate Insulator Deposited by PECVD and PEALD with DIPAS Precursor
- Authors
- 박진성
- Issue Date
- 4-Feb-2020
- Conference Name
- The 27th Korean Conference on Semiconductors (KCS 2020)
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)