Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant
- Authors
- Baek, GeonHo; Lee, Seunghwan; Lee, Jung-Hoon; Park, Jin-Seong
- Issue Date
- Mar-2020
- Publisher
- A V S AMER INST PHYSICS
- Citation
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.38, no.2, pp.1 - 9
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Volume
- 38
- Number
- 2
- Start Page
- 1
- End Page
- 9
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/10598
- DOI
- 10.1116/1.5134055
- ISSN
- 0734-2101
- Abstract
- Molecular layer deposition (MLD) is a thin film technique to make a pure organic coating or hybrid organic-inorganic film, sequentially dosing organic-organic or organic-inorganic precursors, respectively. In this study, hybrid organic-inorganic alucone films were fabricated via MLD using 4-mercaptophenol and trimethylaluminum as organic and metal precursors, respectively, over the deposition temperature range of 100-200 degrees C. The fabricated film was very stable without degradation when exposed to the atmosphere, and the characteristic change was confirmed through annealing under vacuum at 300-750 degrees C. After annealing, the thickness of the alucone films decreased and the bonding of the carbon ring changed, as revealed by the spectroscopic ellipsometer, Fourier-transform infrared, Raman, x-ray diffraction, and x-ray photoelectron spectroscopy results. The annealed alucone films showed thermal polymerization, and their carbon ring structures transformed into graphitic carbon flakes. The alucone film annealed at 750 degrees C showed an electrical resistivity of 0.55 Omega cm. Annealed MLD alucone films, which are hybrid materials, are potential candidates for applications in electronic, capacitor, and thermoelectric devices.
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