Journal of Vacuum Science and Technology A
Journal Title
- Journal of Vacuum Science and Technology A
ISSN
- E 1520-8559 | P 0734-2101
Publisher
- American Institute of Physics
Listed on(Coverage)
| JCR | 1997-2019 |
|---|---|
| SJR | 1999-2019 |
| CiteScore | 2011-2019 |
| SCI | 2010-2019 |
| SCIE | 2010-2021 |
| CC | 2016-2021 |
| SCOPUS | 2017-2020 |
Active
- Active
based on the information
- SCOPUS:2020-10
Country
- USA
Aime & Scopes
- In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split. JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics: /// Applied and fundamental surface science /// Atomic layer deposition /// Electronic and photonic materials and their processing /// Magnetic thin films and interfaces /// Materials and thin films for energy conversion and storage /// Photovoltaics, including inorganic and organic thin-film solar cells /// Plasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronics /// Surface engineering /// Thin film deposition, etching, properties, and characterization /// Transmission electron microscopy, including in situ methods /// Tribology /// Vacuum science and technology