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Gate Voltage Dependence of Low Frequency Noise in Tunneling Field Effect Transistors

Authors
Kim, So-YeongSong, Hyeong-SubKwon, Sung-KyuLim, Dong-HwanChoi, Chang-HwanLee, Ga-WonLee, Hi-Deok
Issue Date
Oct-2019
Publisher
AMER SCIENTIFIC PUBLISHERS
Keywords
Tunneling Field Effect Transistors; Low Frequency Noise (LFN)
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.19, no.10, pp.6083 - 6086
Indexed
SCIE
Journal Title
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume
19
Number
10
Start Page
6083
End Page
6086
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/12439
DOI
10.1166/jnn.2019.16989
ISSN
1533-4880
Abstract
In this paper, the dependency of low frequency noise as a function of the gate voltage was examined for tunneling field effect transistors (TFETs). When the level of gate voltage is low, the tunneling width of the TFETs is large. Thus, electrons move via the trap instead of tunneling directly. On the other hand, when the level of gate voltage is high, the tunneling width of the TFETs becomes narrow. Thus, when the gate voltage is low, the noise level of TFETs is high because electrons pass through the trap. However, when the gate voltage is high, electrons pass directly from valence band of source to conduction band of drain, so the noise level is low. Finding the voltage suitable for this TFET is important to determine the optimum conditions for generating BTBT when measuring TFETs and to reduce noise.
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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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