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Sputter-grown GeTe/Sb2Te3 superlattice interfacial phase change memory for low power and multi-level-cell operationopen access

Authors
Jin, Soo-MinKang, Shin-YoungKim, Hea-JeeLee, Ju-YoungNam, In-HoShim, Tae-HunSong, Yun-HeubPark, Jea-Gun
Issue Date
Jan-2022
Publisher
WILEY
Citation
ELECTRONICS LETTERS, v.58, no.1, pp.38 - 40
Indexed
SCIE
SCOPUS
Journal Title
ELECTRONICS LETTERS
Volume
58
Number
1
Start Page
38
End Page
40
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/139927
DOI
10.1049/ell2.12337
ISSN
0013-5194
Abstract
The multi-level feature of GeTe/Sb2Te3 interfacial phase change memory was achieved by applying a designed voltage-based pulse. It stably demonstrated five multi-level states without interference for 90 cycles by varying the pulse width. GeTe/Sb2Te3 interfacial phase change memory demonstrated retention time of > 1.0 x 10(3) s, presenting the significantly low drift coefficient (nu) of < 0.009, indicating no resistivity drift due to the structure relaxation of glass. In addition, the reset energy consumption of GeTe/Sb2Te3 interfacial phase change memory was reduced by more than 85% compared to conventional Ge2Sb2Te5 phase change memory at each bottom electrode contact size. Multi-level-cell operation mechanism and gradual increase in conductance value of GeTe/Sb2Te3 interfacial phase change memory was explained by a partial resistance transition model where phase transition occurred partially in all layers. The result of the GeTe/Sb2Te3 interfacial phase change memory performance is expected to bring great advantages to the next-generation storage class memory industry that requires low energy and high density.
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