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Design Techniques for Area-efficient Two-Stacked Current Sources in Nanometer CMOS Technology

Authors
Lee, DongjunHan, Jae duk
Issue Date
Nov-2021
Publisher
IEEE
Keywords
current density; current source; deep-submicron CMOS technology; FinFET; output resistance
Citation
Proceedings - International SoC Design Conference 2021, ISOCC 2021, pp.292 - 293
Indexed
SCOPUS
Journal Title
Proceedings - International SoC Design Conference 2021, ISOCC 2021
Start Page
292
End Page
293
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/140375
DOI
10.1109/ISOCC53507.2021.9613881
ISSN
2163-9612
Abstract
Employing long-channel transistors for building current sources increases the analog circuit area because of complicated design rules associated with the use of long channel transistors, especially in advanced CMOS technologies. Therefore, stacked short-channel transistors are preferred for current source construction; however, they require proper design techniques. In this paper, we propose two-stacked current source design techniques, along with small-and large-signal graphical analyses. The results reveal that two-stacked current sources can achieve high output resistance and high current density with a properly determined width ratio.
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