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MgO-Al2O3-SiO2계 유리의 열물성과 내플라즈마성 연구Study on thermal properties and plasma resistance of MgO-Al2O3-SiO2 glass

Other Titles
Study on thermal properties and plasma resistance of MgO-Al2O3-SiO2 glass
Authors
윤지섭최재호정윤성민경원임원빈김형준
Issue Date
Jun-2021
Publisher
한국반도체디스플레이기술학회
Keywords
Plasma resistance; Plasma etching; Alkaline-earth glass; DOE(Design Of Experiments)
Citation
반도체디스플레이기술학회지, v.20, no.2, pp 61 - 66
Pages
6
Indexed
KCI
Journal Title
반도체디스플레이기술학회지
Volume
20
Number
2
Start Page
61
End Page
66
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/141728
ISSN
1738-2270
Abstract
In this study, we studied the alternative of plasma resistant ceramic parts that constitute plasma chambers in the semiconductor dry etching process. MgO-Al2O3-SiO2(MAS) glass was made of 13 types of glass using the Design Of Experiments(DOE) and the effect on thermal properties such as glass transition temperature and crystallization temperature depending on the content of each composition and etching resistance to CF4/O2/Ar plasma gas. MAS glass showed excellent plasma resistance and surface roughness up to 20 times higher than quartz glass. As the content of Al2O3 and MgO increases, the plasma resistance is improved, and it has been confirmed that it has an inverse relationship with SiO2.
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