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Influence of oxygen ion drift on a negative difference behavior in a reset process of bipolar resistive switching

Authors
Bae, Yoon CheolLee, Ah RahmBaek, Gwang HoChung, Je BockKim, Tae YoonIm, Hyun SikHong, Jin Pyo
Issue Date
Mar-2014
Publisher
ELSEVIER
Keywords
XPS; Resistive switching; Non-lattice oxygen; ReRAM
Citation
CURRENT APPLIED PHYSICS, v.14, no.3, pp.355 - 358
Indexed
SCIE
SCOPUS
KCI
Journal Title
CURRENT APPLIED PHYSICS
Volume
14
Number
3
Start Page
355
End Page
358
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/143609
DOI
10.1016/j.cap.2013.11.029
ISSN
1567-1739
Abstract
We present the oxygen ion drift-based resistive switching features of TiOx/TiOy bi-layer homo-junctions. The TiOx layer in this bi-layer configuration was designed to have a stoichiometric chemical composition of TiO2, while the TiOy layer was designed to have a non-stoichiometric chemical composition. X-ray photoelectron spectroscopy measurements were carried out before and after electro-forming to determine the role of non-lattice oxygen content. Variation of the oxygen ion content in the TiO2 layers resulted in changes in the on/off ratio and increased the non-lattice oxygen content. A possible switching mechanism based on oxygen ion content is discussed.
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