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Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
- Issue Date
- Oct-2014
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Keywords
- ICP; neutral gas depletion; plasma uniformity
- Citation
- IEEE TRANSACTIONS ON PLASMA SCIENCE, v.42, no.10, pp.2858 - 2859
- Indexed
- SCIE
SCOPUS
- Journal Title
- IEEE TRANSACTIONS ON PLASMA SCIENCE
- Volume
- 42
- Number
- 10
- Start Page
- 2858
- End Page
- 2859
- ISSN
- 0093-3813
- Abstract
- In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with changing rf power and gas pressure. As the ICP power increases at a fixed argon gas pressure of 100 mtorr, increase in the plasma density is observed at the radial edge. It could be understood by the neutral gas depletion in the discharge center and the step-ionization effect.
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)