Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
High throughput and scalable spatial atomic layer deposition of Al2O3 as a moisture barrier for flexible OLED display
- Authors
- Choi, Hagyoung; Shin, Seokyooon; Choi, Yonghyuk; Choi, Yeongtae; Kim, Junghun; Kim, Sanghun; Kim, Hyungkyu; Park, Jongsik; Chung, Seog Chul; Jeon, Hyeong tag; Oh, Kiyoung
- Issue Date
- Jun-2015
- Keywords
- ALD; Barrier films; OLED; TFE; WVTR
- Citation
- Digest of Technical Papers - SID International Symposium, v.46, no.Book 2, pp 1043 - 1046
- Pages
- 4
- Indexed
- SCOPUS
- Volume
- 46
- Number
- Book 2
- Start Page
- 1043
- End Page
- 1046
- ISSN
- 0097-966X
2168-0159
- Abstract
- We have developed high throughput and scalable space divided atomic layer deposition (ALD) system for thin film encapsulation (TFE) of flexible OLEDs display. In this paper, we report high moisture barrier properties of Al2O3 films deposited by our new developed high throughput (70 Å/min) spatial ALD with 2G glass substrate size (370 × 470 mm2). The WVTR on flexible substrate could achieve ∼10-5 g/m2 -day under tritium test.
- Files in This Item
- Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.