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High throughput and scalable spatial atomic layer deposition of Al2O3 as a moisture barrier for flexible OLED display
- Authors
- Choi, Hagyoung; Shin, Seokyooon; Choi, Yonghyuk; Choi, Yeongtae; Kim, Junghun; Kim, Sanghun; Kim, Hyungkyu; Park, Jongsik; Chung, Seog Chul; Jeon, Hyeong tag; Oh, Kiyoung
- Issue Date
- Jun-2015
- Publisher
- Blackwell Publishing Ltd
- Keywords
- ALD; Barrier films; OLED; TFE; WVTR
- Citation
- Digest of Technical Papers - SID International Symposium, v.46, no.Book 2, pp.1043 - 1046
- Indexed
- SCOPUS
- Volume
- 46
- Number
- Book 2
- Start Page
- 1043
- End Page
- 1046
- ISSN
- 0097-966X
- Abstract
- We have developed high throughput and scalable space divided atomic layer deposition (ALD) system for thin film encapsulation (TFE) of flexible OLEDs display. In this paper, we report high moisture barrier properties of Al2O3 films deposited by our new developed high throughput (70 Å/min) spatial ALD with 2G glass substrate size (370 × 470 mm2). The WVTR on flexible substrate could achieve ∼10-5 g/m2 -day under tritium test.
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Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles
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Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)