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Effect of antimony doping on the low-temperature performance of solution-processed indium oxide thin film transistors

Authors
Kim, Hyo JinJe, So YeonWon, Ju YeonBaek, Jong HanJeong, Jae Kyeong
Issue Date
Oct-2014
Publisher
WILEY-V C H VERLAG GMBH
Keywords
Antimony doping; Indium oxide semiconductors; Lone-pair s-electron; Photobias stability; Thin film transistors
Citation
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.8, pp.924 - 927
Indexed
SCIE
SCOPUS
Journal Title
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
Volume
8
Start Page
924
End Page
927
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/158869
DOI
10.1002/pssr.201409402
ISSN
1862-6254
Abstract
The effects of antimony (Sb) doping on solution-processed indium oxide (InOx) thin film transistors (TFTs) were examined. The Sb-doped InSbO TFT exhibited a high mobility, low gate swing, threshold voltage, and high I-ON/OFF ratio of 4.6 cm(2)/V s, 0.29 V/decade, 1.9 V, and 3 x 10(7), respectively. The gate bias and photobias stability of the InSbO TFTs were also improved by Sb doping compared to those of InOx TFTs. This improvement was attributed to the reduction of oxygen-related defects and/or the existence of the lone-pair s-electron of Sb3+ in amorphous InSbO films.
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