Effect of adding small amount of inductive fields to O-2, Ar/O-2 capacitively coupled plasmas
- Authors
- Lee, Min-Hyong; Lee, Hyo-Chang; Chung, Chin-Wook
- Issue Date
- May-2012
- Publisher
- AMER INST PHYSICS
- Citation
- JOURNAL OF APPLIED PHYSICS, v.111, no.9, pp.1 - 4
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF APPLIED PHYSICS
- Volume
- 111
- Number
- 9
- Start Page
- 1
- End Page
- 4
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/165706
- DOI
- 10.1063/1.4705362
- ISSN
- 0021-8979
- Abstract
- Electron energy distribution functions (EEDFs) of low pressure O-2 plasma were measured by adding small amount of coil power in a capacitive discharge. When the plasma was generated by bias power only, the measured EEDF showed a bi-Maxwellian distribution. However, when a very small coil power (a few Watts) was added, the EEDF evolved abruptly into a Maxwellian distribution, while the electron density was decreased. In an Ar/O-2 mixture discharge, this EEDF evolution to the Maxwellian was also observed at a relatively higher coil power. This abrupt change in EEDFs with a very small coil power appears to be attributed to a combined effect of collisionless heating by capacitive and induced electric fields.
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