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Effect of adding small amount of inductive fields to O-2, Ar/O-2 capacitively coupled plasmas

Authors
Lee, Min-HyongLee, Hyo-ChangChung, Chin-Wook
Issue Date
May-2012
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.111, no.9, pp.1 - 4
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF APPLIED PHYSICS
Volume
111
Number
9
Start Page
1
End Page
4
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/165706
DOI
10.1063/1.4705362
ISSN
0021-8979
Abstract
Electron energy distribution functions (EEDFs) of low pressure O-2 plasma were measured by adding small amount of coil power in a capacitive discharge. When the plasma was generated by bias power only, the measured EEDF showed a bi-Maxwellian distribution. However, when a very small coil power (a few Watts) was added, the EEDF evolved abruptly into a Maxwellian distribution, while the electron density was decreased. In an Ar/O-2 mixture discharge, this EEDF evolution to the Maxwellian was also observed at a relatively higher coil power. This abrupt change in EEDFs with a very small coil power appears to be attributed to a combined effect of collisionless heating by capacitive and induced electric fields.
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