Small-Molecule Nonvolatile Memory Cells Embedded with Ti Nanocrystals Surrounded by TiO2 Tunneling Barrier
- Authors
- Nam, Woo-Sik; Shim, Tae-Hun; Park, Jea-Gun
- Issue Date
- Oct-2011
- Publisher
- IOP PUBLISHING LTD
- Citation
- APPLIED PHYSICS EXPRESS, v.4, no.10, pp.1 - 3
- Indexed
- SCIE
SCOPUS
- Journal Title
- APPLIED PHYSICS EXPRESS
- Volume
- 4
- Number
- 10
- Start Page
- 1
- End Page
- 3
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/167493
- DOI
- 10.1143/APEX.4.105003
- ISSN
- 1882-0778
- Abstract
- We developed cross-bar 4F(2) small-molecule nonvolatile memory-cells embedded with Ti nanocrystals surrounded by a TiO2 tunneling barrier. The Ti nanocrystals size and distribution were primarily determined by the Ti layer evaporation rate followed by in-situ O-2-plasma oxidation; i.e., the size increased with the evaporation rate and the size uniformity of Ti nanocrystals became better as the evaporation rate increased from 0.1-2.0 angstrom/s, then became worse as the evaporation rate increased above 2.0 angstrom/s. At a specific evaporation rate, small-molecule memory-cells embedded with Ti nanocrystals demonstrated typical nonvolatile memory characteristics, such as symmetrical current vs voltage (I-V) characteristics, I-on/I-off ratio of 4.2 x 10(2), stable retention time, and program/erase cycles.
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