E-H mode transition in inductively coupled plasma using Ar, O-2, N-2, and mixture gas
- Authors
- Lee, Jung-Kyu; Lee, Hyo-Chang; Chung, Chin-Wook
- Issue Date
- Sep-2011
- Publisher
- ELSEVIER
- Keywords
- Inductively coupled plasma; E-H mode transition; Inductive mode; Capacitive mode; Electron energy distribution
- Citation
- CURRENT APPLIED PHYSICS, v.11, no.5, pp.S149 - S153
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- CURRENT APPLIED PHYSICS
- Volume
- 11
- Number
- 5
- Start Page
- S149
- End Page
- S153
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/167691
- DOI
- 10.1016/j.cap.2011.04.009
- ISSN
- 1567-1739
- Abstract
- A study of the E-H mode transition was performed in Ar, O-2, N-2, and mixture gas inductively coupled plasma (ICP) from the measurement of the electron energy distribution function (EEDF). Changes of the EEDF and characteristics of the discharge on the E-H mode transition were discussed. At each E-mode, the measured EEDFs had different shapes depending on the gas type and pressure, while the EEDFs evolved into Maxwellian distribution with the E-H transition due to electron-electron collisions. This study was also focused on the transition ICP power when the discharge transits from E-mode to H-mode. As the ICP power increased in Ar discharge, the transition ICP power had minimum value at a particular pressure, while the transition ICP power was gradually increased with gas pressures in molecule gas discharge. The transition ICP power with gas mixing ratios was also studied in Ar/O-2/N-2 mixture gas discharge.
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