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Dependence of resistive switching behaviors on oxygen content of the Pt/TiO2-x/Pt matrix

Authors
Bae, Yoon CheolLee, Ah RahmKwak, June SikIm, HyunsikHong, Jin Pyo
Issue Date
Mar-2011
Publisher
ELSEVIER SCIENCE BV
Keywords
ReRAM; Nonvolatile memory; Resistive switching
Citation
CURRENT APPLIED PHYSICS, v.11, no.2, pp.E66 - E69
Indexed
SCIE
SCOPUS
KCI
Journal Title
CURRENT APPLIED PHYSICS
Volume
11
Number
2
Start Page
E66
End Page
E69
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/168939
DOI
10.1016/j.cap.2010.11.125
ISSN
1567-1739
Abstract
The resistive switching characteristics of poly-crystal rutile TiO2-x thin film between Pt electrodes with different oxygen contents were studied. Current level analyses and dielectric material analyses of TiO2-x, X-ray diffraction, atomic force microscopy, and Rutherford backscattering spectrometry were performed to explain the possible nature of the stable resistive switching phenomenon at specific oxygen contents, along with impedance spectroscopy analysis. The experimental observations demonstrate that the distributions of the set/reset voltage and on/off current level strongly depend on the oxygen content of the TiO2-x layer.
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