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Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma

Authors
Lee, Hyo-ChangChung, Chin-Wook
Issue Date
Jul-2010
Publisher
Elsevier Sequoia
Keywords
Inductively coupled plasma; Biased inductively coupled plasma; RE bias power Impedance transition; Electron series resonance
Citation
Thin Solid Films, v.518, no.18, pp 5219 - 5222
Pages
4
Indexed
SCI
SCIE
SCOPUS
Journal Title
Thin Solid Films
Volume
518
Number
18
Start Page
5219
End Page
5222
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/174464
DOI
10.1016/j.tsf.2010.03.147
ISSN
0040-6090
Abstract
The impedance transition and electron series resonance at an RF bias substrate were observed in 13.56 MHz inductively coupled plasma (ICP). As ICP coil power increased, the impedance of the RF bias transitioned from a capacitive to an inductive load. When bias voltages and discharge impedances reached minimums, bias voltages and currents were in-phase during the transition. The transition can be understood as a series LC resonance between the sheaths (capacitor) and plasma bulks (inductance due to electron inertia). This corresponds to the electron series resonance (ESR) observed in very high-frequency capacitive discharges, and a new ESR frequency which considers sheath resistances is presented.
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