Nanoscale patterning using photo-assisted polymer transfer lithography

Abstract

We successfully demonstrate photo-assisted polymer transfer lithography for submicron-size patterning to greatly simplify conventional decal transfer lithography. For a small size patterning, this process includes three main processes: fabrication of a precise poly-dimethylsiloxaene (PDMS) stamp, TiO2 film deposition on substrate and subsequent annealing processes to form anatase crystalline phase, and pattern transfer process onto substrate with light illumination. The adhesion of PDMS onto TiO2 substrate is related to the photocatalystic reaction of anatase TiO2 film, which is caused by rapid thermal anneal at least above 300 degrees C. This soft lithographic technique demonstrates the formation of high line and dot patterns simultaneously without any additional adhesion-promotion and time-urgent processes.