Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Novel hybrid mask mold for combined nanoimprint and photolithography technique
- Authors
- Moon, Kanghun; Choi, Banglim; Park, In-Sung; Hong, Sunghun; Yang, Kihyun; Lee, Heon; Ahn, Jinho
- Issue Date
- Apr-2006
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- nanoimprint lithography; photolithography; hybrid mask mold; anti-sticking property
- Citation
- MICROELECTRONIC ENGINEERING, v.83, no.4-9, pp.889 - 892
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 83
- Number
- 4-9
- Start Page
- 889
- End Page
- 892
- ISSN
- 0167-9317
- Abstract
- We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects.
- Files in This Item
- Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)