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Hysteresis-Free Like, High Mobility p-Channel Tin Monoxide Thin-Film Transistor

Authors
Kim, TaikyuKim, Se EunJeong, Jae Kyeong
Issue Date
Dec-2022
Publisher
International Display Workshops
Keywords
high mobility; hysteresis-free; p-type oxide semiconductor; thin-film transistor; tin monoxide
Citation
Proceedings of the International Display Workshops, v.29, pp.223 - 225
Indexed
SCOPUS
Journal Title
Proceedings of the International Display Workshops
Volume
29
Start Page
223
End Page
225
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/192915
DOI
10.36463/idw.2022.0223
ISSN
1883-2490
Abstract
We demonstrate high mobility p-channel tin monoxide (SnO) thin-film transistors with hysteresis free-like behavior. Intermediate alumina encapsulation in the middle of two postdeposition annealing processes significantly facilitates crystal growth, enabling considerable intertwining between crystals. Here, we report a simple method crystallizing the SnO thin-film.
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Jeong, Jae Kyeong
COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)
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