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Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum) Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402)
- Other Titles
- Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum) Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402)
- Authors
- Shen, Tao; Mochi, Iacopo; Jeong, Dongmin; Mueller, Elisabeth; Ansuinelli, Paolo; Ahn, Jinho; Ekinci, Yasin
- Issue Date
- Oct-2024
- Publisher
- SPIE - International Society for Optical Engineering
- Citation
- Journal of Micro/ Nanolithography, MEMS, and MOEMS, v.23, no.4, pp 1 - 2
- Pages
- 2
- Indexed
- SCIE
SCOPUS
- Journal Title
- Journal of Micro/ Nanolithography, MEMS, and MOEMS
- Volume
- 23
- Number
- 4
- Start Page
- 1
- End Page
- 2
- ISSN
- 1932-5150
1932-5134
- Abstract
- This article [J. Micro/Nanopattern. Mater. Metrol., 23(4), 041402 (2024) https://doi.org/10 .1117/1.JMM.23.4.041402] was originally published online on 12 July 2024 with errors in Table 1 and in the Materials and Methods section. STEM measurements in the table and their corresponding mentions in the text were incorrect. The original table is shown below: (Table presented).
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)