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High-NA EUV 흡수 소재 선정을 위한 Mask 3D effect 완화 광학상수 영역 분석 연구

Authors
안진호
Issue Date
11-Aug-2025
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/209708
Place
수원컨벤션센터
Conference Name
2025 차세대 리소그래피 학술대회
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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Ahn, Jinho
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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