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Ferroelectric Memcapacitor Crossbar Array with NAND Flash Structure for In-Memory Computing

Authors
Hwang, HwihoYu, JunsuYoun, SangwookKim, Hyungjin
Issue Date
Jan-2026
Publisher
Institute of Electrical and Electronics Engineers Inc.
Citation
2025 IEEE International Electron Devices Meeting (IEDM), pp 1 - 4
Pages
4
Indexed
SCOPUS
Journal Title
2025 IEEE International Electron Devices Meeting (IEDM)
Start Page
1
End Page
4
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/212271
DOI
10.1109/IEDM50572.2025.11353797
ISSN
0163-1918
2156-017X
Abstract
In this paper, 48×24 ferroelectric memcapacitor crossbar is experimentally demonstrated based on NAND flash structure, with TiN/HZO/SiO2/poly-Si gate stack. With the optimal read voltage, a wide charge memory window of ~12.27 fC/μm2 is achieved. Read, write, and inhibit operations are successfully verified across the fabricated array, enabling reliable 4-bit multilevel programming with retention over 10 years. Vector-matrix multiplication operations are confirmed with an R2 value of 0.984, with the verification of output sensing circuit. Also, CIFAR-10 classification is implemented on the fabricated 48×24 array by pretrained weight transfer with 4-bit device states, achieving accuracy of 87.75%. The feasibility of vertically stacked structure based on 3D-NAND flash is also verified by TCAD and SPICE simulations.
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