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이미징 성능 및 Best Focus Shift 완화를 위한 High-NA EUV 마스크용 Bilayer 흡수체 구조 연구
- Authors
- 안진호
- Issue Date
- 29-Jan-2026
- Place
- 강원도 하이원리조트
- Conference Name
- The 33nd Korean Conference on Semiconductors
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)