Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
The effect of electron and ion beam on Si etching generated in a low pressure inductively coupled plasma with a DC-biased Grids
- Authors
- 정진욱
- Issue Date
- 26-Feb-2025
- Place
- San Jose, California, US
- Conference Name
- SPIE Advanced Lithography + Patterning 2025
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)