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Selective Generation of CF₂ Radicals in Ar/CF₄ Plasma with a DC-Biased Grid for High-Precision Atomic Layer Etching
- Authors
- 정진욱
- Issue Date
- 23-Jun-2025
- Place
- International Convention Center Jeju (ICC Jeju), Jeju Island, South Korea
- Conference Name
- ALD/ALE 2025
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)