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Reduction of Plasma-Induced Damage via Ultra-Low Electron Temperature Plasma in Gate-All-Around FET Fabrication
- Authors
- 정진욱
- Issue Date
- 25-Sep-2025
- Place
- Charlotte Convention Center, Charlotte, North Carolina, USA
- Conference Name
- AVS 71st International Symposium & Exhibition
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)