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Cited 145 time in webofscience Cited 135 time in scopus
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High-Performance 2D Rhenium Disulfide (ReS₂) Transistors and Photodetectors by Oxygen Plasma TreatmentHigh-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment

Other Titles
High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment
Authors
Shim, JaewooOh, AelyKang, Dong-HoOh, SeyongJang, Sung KyuJeon, JaehoJeon, Min HwanKim, MinwooChoi, ChanghwanLee, JaehyeongLee, SungjooYeom, Geun YoungSong, Young JaePark, Jin-Hong
Issue Date
Aug-2016
Publisher
WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Citation
Advanced Materials, v.28, no.32, pp 6985 - 6992
Pages
8
Indexed
SCI
SCIE
SCOPUS
Journal Title
Advanced Materials
Volume
28
Number
32
Start Page
6985
End Page
6992
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/22290
DOI
10.1002/adma.201601002
ISSN
0935-9648
1521-4095
Abstract
A high-performance ReS₂-based thin-film transistor and photodetector with high on/off-current ratio (10⁴), high mobility (7.6 cm² V⁻¹ s⁻¹), high photoresponsivity (2.5 x 10⁷ A W⁻¹), and fast temporal response (rising and decaying time of 670 ms and 5.6 s, respectively) through O₂ plasma treatment is reported.
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Choi, Chang hwan
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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