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2. Conference Papers(서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers)2,853

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Collection's Items (Sorted by Submit Date in Descending order): 921 to 940 of 2853

Effect of Slurry Characteristics on Nanotopography Impact in Chemical Mechanical Polishing and Its Numerical Simulation

박재근

ConferenceIssue Date2003Place연세대학교
HIGH SELECTIVE NANO CERIA SLURRY:ITS MECHANISM AND CONTROL OF NANOTOPOGRAPHY IMPACT

박재근

ConferenceIssue Date2003Place서울교육문화회관
나노세리아 슬러리에 첨가된 연마입자와 첨가제의 농도가 CMP연마판 온도에 미치는 영향

박재근

ConferenceIssue Date2003Place한양대학교(안산)
SDR Forum Board of Directors Meeting

최승원

ConferenceIssue Date2003CitationSDR ForumPublisherSDR ForumPlaceteleconference
Analysis and design of FBAR filters

김형동

ConferenceIssue Date2003PlaceICU 디지털미디어연구소
방송 영상처리 기술 전망

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ConferenceIssue Date2003Citation디지털방송 영상처리기술Publisher특허청PlaceCOEX 컨퍼런스센터3층 320호
SDR Forum Board of Directors Meeting

최승원

ConferenceIssue Date2004CitationSDR ForumPublisherSDR ForumPlaceteleconference
SDR Forum Board of Directors Meeting

최승원

ConferenceIssue Date2004CitationSDR ForumPublisherSDR ForumPlaceteleconference
Dependence of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemcial Mechanical Polishing

박재근

ConferenceIssue Date2004PlaceMujoo Resort, Seoul, Korea
Design of Oxygen Precipitate Formation in 300mm Silicon Wafer Using NH3/Ar Rapid Thermal Annealing

박재근

ConferenceIssue Date2004Place무주리조트 호텔티롤
Effect of strained Si SiGe grown on Insulator on n-MOSFET Transport Characteristic Improvement

박재근

ConferenceIssue Date2004Place무주리조트 호텔티롤
Nanotopography Impact and Non-Prestonian Behavior of Ceria Slurry in STI-CMP

박재근

ConferenceIssue Date2004PlaceMujoo Resort, Seoul, Korea
Nanotopography Impact and Planarization Efficiency of Ceria Slurry for STI-CMP

박재근

ConferenceIssue Date2004PlaceKIER, Dae-jeon, Korea
MPEG 오디오 압축 표준 기술: MPEG-1, MPEG-2, MPEG-4

정제창

ConferenceIssue Date2004Citation멀티미디어 표준 및 특허동향 워크샵Publisher한국표준협회, 대한전자공학회Place한국과학기술회관
General overview of recent Korean nanofabrication programs and establishment of new Center of Excellence at Hanyang University

박재근

ConferenceIssue Date2004PlaceMarriott Waikoloa Beach Resortm HI
The Effect of Rheological Behavior of Collidal Silica Slurry with Organic Addittive on Wafer Polishing Process

박재근

ConferenceIssue Date2004PlaceKorea University, Seoul, Korea
A Study on the Electrokinetic Behavior of Nano-size Ceria Particulate for Damascene Gate Chemical Mechanical Planarization in ULSI Process

박재근

ConferenceIssue Date2004PlaceKorea University, Seoul, Korea
SDR 기술연구

최승원

ConferenceIssue Date2004CitationSDR ForumPublisherSDR ForumPlace독일 Mainz
The Rheological Behavior of Colloidal Silica Slurry and Its Influence on Wafer Polishing Process

박재근

ConferenceIssue Date2004PlaceIndiana Convention Center & RCA Dome, Indianapolis, Indiana, USA
사무이동화 서비스 시스템과 디지털TRS기술전망

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ConferenceIssue Date2004
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