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Cited 5 time in webofscience Cited 6 time in scopus
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Electrical stability enhancement of GeInGaO thin-film transistors by solution-processed Li-doped yttrium oxide passivation

Authors
Choi, Uy HyunYoon, SungyeolYoon, Doo HyunTak, Young JunKim, Yeong GyuAhn, Byung DuPark, Jin SeongKim, Hyun Jae
Issue Date
Jul-2016
Publisher
IOP PUBLISHING LTD
Keywords
GeInGaO; passivation layer; thin-film transistor; diffusion; oxygen vacancy
Citation
JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.49, no.28, pp.1 - 6
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume
49
Number
28
Start Page
1
End Page
6
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/22943
DOI
10.1088/0022-3727/49/28/285103
ISSN
0022-3727
Abstract
In this study, we investigated a method of enhancing the electrical stability of GeInGaO thin-film transistors (TFTs) using a Li-doped Y₂O₃ (YO) passivation layer (PVL). Li reduced metal hydroxide groups in the PVL, and diffused into the channel layer and reduced the oxygen vacancy at the top surface of the channel layer, which is the origin of the defect state and electrical instability. In addition, the negative-bias temperature stress (NBTS) for 3600 s improved for Li-doped YO (LYO) PVL. The threshold voltage shift decreased from -10.3 V for the YO PVL to -4.8 V for the LYO PVL, a 54% improvement.
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