스핀코터를 이용한 박막의 기계적 안정성 평가Mechanical stability evaluation of thin film with spin-coater
- Other Titles
- Mechanical stability evaluation of thin film with spin-coater
- Authors
- 김지은; 김정환; 홍성철; 조한구; 안진호
- Issue Date
- Mar-2016
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- EUV pellicle; thin film; mechanical stability; spin-coater
- Citation
- 반도체디스플레이기술학회지, v.15, no.1, pp.6 - 11
- Indexed
- KCI
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 15
- Number
- 1
- Start Page
- 6
- End Page
- 11
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/23880
- ISSN
- 1738-2270
- Abstract
- For high volume manufacturing using extreme ultraviolet (EUV) lithography, mask protection from contamination during lithography process must be solved, and EUV pellicle is the strongest solution. Based on the technical requirements of EUV pellicle, EUV pellicle should have large membrane area (110 × 140 mm2) with film transmittance over 90% and mechanical stability. Even though pellicle that satisfies size standard with high transmittance has been reported, its mechanical stability has not been confirmed, nor is there a standard to evaluate the mechanical stability. In this study, we suggest a rather simple method evaluating mechanical stability of pellicle membrane using spin-coater which can emulate the linear accelerated motion. The test conditions were designed by simulating the acceleration distribution inside pellicle membrane through correlating the linear acceleration and centripetal acceleration, which occurs during linear movement and rotation movement, respectively. By these simulation results, we confirmed the possibility of using spin-coater to evaluate the mechanical stability of EUV pellicle.
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