Two-step flash light sintering process for enhanced adhesion between copper complex ion/silane ink and a flexible substrate
- Authors
- Jeon, Eun-Beom; Joo, Sung-Jun; Ahn, Heejoon; Kim, Hak-Sung
- Issue Date
- Mar-2016
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Two-step sintering method; Flash light sintering; Copper nanoparticle; Copper precursor; Adhesion; Oxygen plasma
- Citation
- THIN SOLID FILMS, v.603, pp.382 - 390
- Indexed
- SCIE
SCOPUS
- Journal Title
- THIN SOLID FILMS
- Volume
- 603
- Start Page
- 382
- End Page
- 390
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/23936
- DOI
- 10.1016/j.tsf.2016.02.033
- ISSN
- 0040-6090
- Abstract
- A copper complex ion ink (including copper nanoparticles, a copper precursor and a silane coupling agent) was synthesized to enhance the adhesion between the copper pattern and a polyimide (PI) substrate. Oxygen plasma treatment was performed on the polyimide substrate to initiate a chemical reaction between the complex ion ink and the polyimide. Then, a two-step flash light sintering method (consisting of preheating and main sintering) was used to sinter the copper complex ion ink. The copper complex ion patterns were characterized as a function of the weight fraction of silane coupling agent using scanning electron microscopy (SEM), a four-point probe method and adhesion testing. In addition, a bending fatigue test was performed to evaluate the reliability of the conductive copper pattern under cyclic bending. The copper pattern fabricated with copper complex ion ink containing 3 wt% silane coupling agent exhibited the highest adhesion level (5B), the lowest resistivity (7.6 μΩ·cm) and a low resistance change (18%) after the bending fatigue test. The two-step sintering method used to enhance the adhesion between the copper complex ion ink and polyimide substrate was also studied using X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FT-IR).
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