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Characteristics of Atomic Layer Deposition SnO2 films using TDMASn precursor and various oxygen reactants
- Authors
- 박진성
- Issue Date
- 9-Oct-2013
- Publisher
- Taiwan Association for coating and thin films technology
- Citation
- TACT 2013 (Taiwan Association for Coating and Thin Films Technology)
- Conference Name
- TACT 2013 (Taiwan Association for Coating and Thin Films Technology)
- Place
- The Grand hotel, Taipei, Taiwan
- Files in This Item
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)