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Post annealing effect of the P-type copper oxide thin films using atomic layer deposition
- Authors
- 박진성
- Issue Date
- 27-Aug-2013
- Publisher
- european society of thin films, fraunhofer
- Citation
- the 9th Asian-European International Conference On Plasma Surface Engineering
- Conference Name
- the 9th Asian-European International Conference On Plasma Surface Engineering
- Place
- Ramada plaza Jeju hotel, Jeju, Koera
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)