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Controllability of Workfunction and EOT Scaling with High-K/Metal Gate for Gate-First CMOS Applications
- Authors
- 최창환
- Issue Date
- 23-Aug-2010
- Publisher
- International Union of Materials Research Societies
- Citation
- IUMRS-ICEM 2010
- Conference Name
- IUMRS-ICEM 2010
- Place
- Seoul KINTEX, KOREA
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)