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A study on the simulation and characterization of the barrier layers for EUV reflective multilayers for EUV lithography applications
- Authors
- 안진호
- Issue Date
- 9-Oct-2002
- Place
- Hakone
- Conference Name
- The 3rd Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)