Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Etching Characteristics of Fine Ta Patterns with Electron cyclotron resonance chlrorine plasma
- Authors
- 안진호
- Issue Date
- 24-Apr-2000
- Place
- KIST
- Conference Name
- Proceedings of international joint symposium on Microelectronics and Packaging
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)