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Low-temperature direct synthesis of high quality WS <inf>2</inf> thin films by plasma-enhanced atomic layer deposition for energy related applications

Authors
YeoS.NandiD.K.RahulR.KimT.H.Shong, BonggeunB.JangY.BaeJ.-S.HanJ.W.KimS.-H.KimH.
Issue Date
2018
Citation
Applied Surface Science, v.459, pp.596 - 605
Journal Title
Applied Surface Science
Volume
459
Start Page
596
End Page
605
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/13069
DOI
10.1016/j.apsusc.2018.07.210
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