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Initial nucleation for atomic layer deposition (ALD) of group III oxides: a quantum chemical comparative study
- Authors
- 송봉근
- Issue Date
- 25-Apr-2019
- Publisher
- 한국화학공학회
- Citation
- 한국화학공학회 학술대회 초록집, v.0, no.0, pp.0 - 0
- Journal Title
- 한국화학공학회 학술대회 초록집
- Volume
- 0
- Number
- 0
- Start Page
- 0
- End Page
- 0
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Collections - College of Engineering > Chemical Engineering Major > 1. Journal Articles
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Related Researcher
- Shong, Bong geun
- Engineering (Chemical Engineering)