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Strain Effects in van der Pauw (VDP) Stress Sensor Fabricated on (111) Silicon

Authors
Cho, Chun-HyungChoi, GinkyuCha, Ho-Young
Issue Date
May-2010
Publisher
IEICE-INST ELECTRONICS INFORMATION COMMUNICATIONS ENG
Keywords
VDP (van der Pauw) strain effects (111) silicon stress sensors; piezo-resistive coefficients
Citation
IEICE TRANSACTIONS ON ELECTRONICS, v.E93C, no.5, pp.640 - 643
Journal Title
IEICE TRANSACTIONS ON ELECTRONICS
Volume
E93C
Number
5
Start Page
640
End Page
643
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/20809
DOI
10.1587/transele.E93.C.640
ISSN
0916-8524
Abstract
We have fabricated VDP (van der Pauw) stress sensors on (111) silicon surfaces. This work focuses on a study of strain effects in VDP stress sensors, which were generally ignored in previous works, for the precise measurements of die stresses in electronic packages. The stress sensitivity was observed to be approximately 10% larger for p-type VDP sensors compared to n-type VDP sensors.
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College of Engineering > School of Electronic & Electrical Engineering > 1. Journal Articles
College of Science and Technology > Department of Electronic and Electrical Engineering > 1. Journal Articles

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Science & Technology (Department of Electronic & Electrical Convergence Engineering)
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