Advantages of NiOx electrode over Au in low-voltage tetracene-based phototransistors
- Authors
- Choi, Jeong-M.; Lee, Kimoon; Hwang, D. K.; Kim, Jae Hoon; Im, Seongil; Park, Ji Hoon; Kim, Eugene
- Issue Date
- 1-Dec-2006
- Publisher
- AMER INST PHYSICS
- Citation
- JOURNAL OF APPLIED PHYSICS, v.100, no.11
- Journal Title
- JOURNAL OF APPLIED PHYSICS
- Volume
- 100
- Number
- 11
- URI
- https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/24486
- DOI
- 10.1063/1.2396712
- ISSN
- 0021-8979
- Abstract
- We report on the tetracene-based photo-thin-film transistors (photo-TFTs) which adopt thin poly-4-vinylphenol (PVP)/aluminum oxide (AlOx) bilayer for a gate dielectric and two different source/drain (S/D) electrodes: semitransparent NiOx and Au. Our tetracene-based TFT with NiOx S/D electrode exhibited quite good field effect mobility (mu=similar to 0.23 cm(2)/V s), high on/off current ratio (I-on/I-off) of similar to 10(5), and good photo-to-dark current ratio (I-ph/I-dark=similar to 10(4)) under an ultraviolet (364 nm) illumination while that with Au S/D electrodes showed much lower device performance (mu=similar to 0.08 cm(2)/V s, I-on/I-off=similar to 10(4), and I-ph/I-dark=similar to 20), although the both TFTs operated at a low voltage of -8 V. With the hole-injection and light-reception advantages of NiOx electrode, our tetracene photo-TFT demonstrated good dynamic optical gating. (c) 2006 American Institute of Physics.
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