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SCIESCOPUSKCI

Memory Characteristics of MNNOS Capacitors with Various Energy Band Gaps of Silicon Nitride

Son, H[Son, Hyukjoo]; Lee, YJ[Lee, Youn-Jung]; Jung, SW[Jung, Sungwook]; Jang, K[Jang, Kyungsoo]; Kim, J[Kim, Jaehong]; Cho, J[Cho, Jaehyun]; Heo, J[Heo, Jongkyu]; Kim, BS[Kim, Byung-Sung]; Yi, JS[Yi, Junsin]

ArticleIssue Date2009CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.54, no.4, pp.1492 - 1495PublisherKOREAN PHYSICAL SOC

SCIESCOPUS

Fabrication of polycrystalline silicon thin films on glass substrates using fiber laser crystallization

Dao, VA[Dao, Vinh Ai]; Han, K[Han, Kuymin]; Heo, J[Heo, Jongkyu]; Kyeong, D[Kyeong, Dohyeon]; Kim, J[Kim, Jaehong]; Lee, Y[Lee, Youngseok]; Kim, Y[Kim, Yongkuk]; Jung, S[Jung, Sungwook]; Kim, K[Kim, Kyunghae]; Yi, J[Yi, Junsin]

ArticleIssue Date2009CitationTHIN SOLID FILMS, v.517, no.14, pp.3971 - 3974PublisherELSEVIER SCIENCE SA

SCIESCOPUS

Embedded NVM Devices with Solid-Phase Crystallized Poly-Si Film on a Glass Substrate for System-on-Panel Applications

Jung, S[Jung, Sungwook]; Nga, NT[Nga, Nguyen Thanh]; Jang, K[Jang, Kyungsoo]; Kim, D[Kim, Doyoung]; Choi, B[Choi, Byoungdeog]; Mo, Y[Mo, Yeongon]; Lee, K[Lee, Kiyong]; Yi, J[Yi, Junsin]

ArticleIssue Date2009CitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.156, no.10, pp.G152 - G155PublisherELECTROCHEMICAL SOC INC

SCIESCOPUS

Comparative study of electro-physical properties of heterostructures containing PECVD nanocrystalline and anodic porous silicon layers

Vikulov, VA[Vikulov, V. A.]; Korobtsov, VV[Korobtsov, V. V.]; Dimitriev, AA[Dimitriev, A. A.]; Kim, K[Kim, K.]; Jung, S[Jung, S.]; Yi, J[Yi, J.]

ArticleIssue Date2009CitationTHIN SOLID FILMS, v.517, no.14, pp.3912 - 3915PublisherELSEVIER SCIENCE SA

SCIESCOPUS

Electroluminescence and impedance analyses of organic light emitting diodes using anhydride materials as cathode interfacial layers

Nam, E[Nam, Eunkyoung]; Park, H[Park, Hyungjun]; Park, K[Park, Keunhee]; Moon, MR[Moon, Mi Ran]; Sohn, S[Sohn, Sunyoung]; Jung, D[Jung, Donggeun]; Yi, J[Yi, Junsin]; Chae, H[Chae, Heeyeop]; Kim, H[Kim, Hyoungsub]

ArticleIssue Date2009CitationTHIN SOLID FILMS, v.517, no.14, pp.4131 - 4134PublisherELSEVIER SCIENCE SA

SCIESCOPUS

Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon

Dao, VA[Dao, Vinh Ai]; Van Duy, N[Van Duy, Nguyen]; Heo, J[Heo, Jongkyu]; Choi, H[Choi, Hyungwook]; Kim, Y[Kim, Youngkuk]; Lakshminarayan[Lakshminarayan]; Yi, J[Yi, Junsin]

ArticleIssue Date2009CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.6PublisherIOP PUBLISHING LTD

SCIESCOPUS

Black surface structures for crystalline silicon solar cells

Yoo, J[Yoo, Jinsu]; Yu, G[Yu, Gwonjong]; Yi, J[Yi, Junsin]

ArticleIssue Date2009CitationMATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, v.159-60, pp.333 - 337PublisherELSEVIER SCIENCE BV

SCIESCOPUS

Effect of N2O/SiH4 flow ratios on properties of amorphous silicon oxide thin films deposited by inductively-coupled plasma chemical vapor deposition with application to silicon surface passivation

Dao, VA[Dao, Vinh-Ai]; Nguyen, VD[Nguyen, Van-Duy]; Heo, J[Heo, Jongkyu]; Choi, H[Choi, Hyungwook]; Kim, Y[Kim, Youngkuk]; Lakshminarayan, N[Lakshminarayan, Nariangadu]; Yi, J[Yi, Junsin]

ArticleIssue Date2009CitationVACUUM, v.84, no.3, pp.410 - 414PublisherPERGAMON-ELSEVIER SCIENCE LTD

SCIESCOPUS

Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel

Nguyen, TN[Nguyen, Thanh Nga]; Nguyen, VD[Nguyen, Van Duy]; Jung, S[Jung, Sungwook]; Yi, J[Yi, Junsin]

ArticleIssue Date2009CitationAPPLIED SURFACE SCIENCE, v.255, no.19, pp.8252 - 8256PublisherELSEVIER SCIENCE BV

SCIESCOPUS

Investigation on phosphorus doping using H3PO4 as doping source by simple dip method and its electrical characterisation

Moon, I[Moon, I.]; Gunasekaran, M[Gunasekaran, M.]; Kim, K[Kim, K.]; Ju, M[Ju, M.]; Han, S[Han, S.]; Yi, J[Yi, J.]

ArticleIssue Date2009CitationSURFACE ENGINEERING, v.25, no.2, pp.151 - 155PublisherMANEY PUBLISHING

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