CAU Scholar's Space: Search

Results 1-10 of 52 (Search time: 0.017 seconds).

BCl₃/Ar 플라즈마에 Cl₂ 가스 첨가에 따른 TiN 박막의 식각 특성

엄두승; 우종창; 김동표; 김창일

ArticleIssue Date2008Citation전기전자재료학회논문지, v.21, no.12, pp 1051 - 1056Publisher한국전기전자재료학회

Damage on the surface of zinc oxide thin films etched in CL-based gas chemistry

Woo, J.-C.; Ha, T.-K.; Li, C.; Kim, S.-H.; Park, J.-S.; Heo, K.-M.; Kim, C.-I.

ArticleIssue Date2011CitationTransactions on Electrical and Electronic Materials, v.12, no.2, pp 51 - 55Publisher한국전기전자재료학회

Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구

박재화; 김경태; 김동표; 김창일; 장의구

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.6Publisher한국전기전자재료학회

The Etch Characteristics of the CoFe Thin Film Using an Inductively Coupled Plasma System

Um, Doo-Seung; Woo, Jong-Chang; Yang, Xue; Kim, Chang-Il

ArticleIssue Date2010CitationFERROELECTRICS, v.406, no.1, pp 185 - 191PublisherTAYLOR & FRANCIS LTD

Dry Etching of BST using Inductively Coupled Plasma

Gwan-Ha Kim; 김경태; 김동표; 김창일

ArticleIssue Date2005CitationTransactions on Electrical and Electronic Materials, v.6, no.2, pp 46 - 50Publisher한국전기전자재료학회

Dry etching characteristics of TiN thin films in CF4/BCl3/N-2 plasma

Joo, Young-Hee; Woo, Jong-Chang; Kim, Chang-Il

ArticleIssue Date2012CitationTHIN SOLID FILMS, v.520, no.6, pp 2339 - 2342PublisherELSEVIER SCIENCE SA

Dry etching of TaN thin film using CH4/Ar inductively coupled plasma

Woo, Jong-Chang; Kim, Chang-Il

ArticleIssue Date2011CitationVACUUM, v.86, no.1, pp 1 - 6PublisherPERGAMON-ELSEVIER SCIENCE LTD

CF4/Cl2/Ar 유도 결합 플라즈마에 의한 gold 박막의 식각특성

장윤성; 김동표; 김창일; 장의구

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.7Publisher한국전기전자재료학회

Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

Ha, Tae-Kyung; Woo, Jong-Chang; Kim, Chang-Il

ArticleIssue Date2011CitationVACUUM, v.85, no.10, pp 932 - 937PublisherPERGAMON-ELSEVIER SCIENCE LTD

Ar/CF4 유도결합 플라즈마를 이용한 BET 박막의 식각 메커니즘

임규태; 김경태; 김동표; 김창일

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.4Publisher한국전기전자재료학회

1 2 3 4 next 6

Discover

RSS_1.0 RSS_2.0 ATOM_1.0

84, Heukseok-ro, Dongjak-gu, Seoul, Republic of Korea (06974)02-820-6194

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

Discover

Author

Subject

Date Issued

Type

Language

Journal

BROWSE