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Results 1-6 of 6 (Search time: 0.491 seconds).

The use of inductively coupled CF4/Ar plasma to improve the etch rate of ZrO2 thin films

Kim, H.-S.; Woo, J.-C.; Joo, Y.-H.; Kim, C.-I.

ArticleIssue Date2013CitationTransactions on Electrical and Electronic Materials, v.14, no.1, pp 12 - 15Publisher한국전기전자재료학회
The dry etching properties on TiN thin film using an N<inf>2</inf>/BCl<inf>3</inf>/Ar inductively coupled plasma

Woo, J.-C.; Joo, Y.-H.; Park, J.-S.; Kim, C.-I.

ArticleIssue Date2011CitationTransactions on Electrical and Electronic Materials, v.12, no.4, pp 144 - 147PublisherKorean Institute of Electrical and Electronic Material Engineers
Dry etching characteristics of TiN thin films in BCl3-based plasma

Woo, J.-C.; Park, J.-S.; Kim, C.-I.

ArticleIssue Date2011CitationTransactions on Electrical and Electronic Materials, v.12, no.3, pp 106 - 109Publisher한국전기전자재료학회
Dry etching characteristics of indium zinc oxide thin films in adaptive coupled plasma

Woo, J.-C.; Choi, C.-A.; Kim, C.-I.

ArticleIssue Date2013CitationTransactions on Electrical and Electronic Materials, v.14, no.4, pp 216 - 220Publisher한국전기전자재료학회
Dry etching characteristics of ZnO thin films for the optoelectronic device by using inductively coupled plasma

Joo, Y.-H.; Woo, J.-C.; Kim, C.-I.

ArticleIssue Date2012CitationTransactions on Electrical and Electronic Materials, v.13, no.1, pp 6 - 9Publisher한국전기전자재료학회
Dry etching properties of TiO 2 thin film using inductively coupled plasma for resistive random access memory application

Joo, Y.-H.; Woo, J.-C.; Kim, C.-I.

ArticleIssue Date2012CitationTransactions on Electrical and Electronic Materials, v.13, no.3, pp 144 - 148Publisher한국전기전자재료학회
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