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The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system

Woo, Jong-Chang; Chun, Yoon-Soo; Joo, Young-Hee; Kim, Chang-II

ArticleIssue Date2012CitationVACUUM, v.86, no.12, pp 2152 - 2157PublisherPERGAMON-ELSEVIER SCIENCE LTD
Characteristics of photoresist-derived carbon nanofibers for Li-ion full cell electrode

Kim, H.-J.; Joo, Y.-H.; Lee, S.-M.; Kim, C.-I.

ArticleIssue Date2014CitationTransactions on Electrical and Electronic Materials, v.15, no.5, pp 265 - 269PublisherKorean Institute of Electrical and Electronic Material Engineers
유도 결합 플라즈마를 이용한 TaN 박막의 건식 식각 특성

진려; 주영희; 우종창; 김한수; 최경록; 김창일

ArticleIssue Date2013Citation전기전자재료학회논문지, v.26, no.1, pp 1 - 5Publisher한국전기전자재료학회
Diverse Texturing Characteristics Through Metal-Assisted Plasma Etching with Silver Nanowires

Lee, Dong-Geon; Ryu, Hyun-Seung; Jin, Mi-Jin; Um, Doo-Seung; Kim, Chang-Il

ArticleIssue Date2024CitationPLASMA CHEMISTRY AND PLASMA PROCESSINGPublisherSPRINGER
Dry etching of YMnO3 thin films in Ar/Cl-2 and CF4/Cl-2 plasmas

Kim, DP; Kim, CI

ArticleIssue Date2003CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.43, no.5, pp 738 - 742PublisherKOREAN PHYSICAL SOC
BCl3/Ar 유도 결합 플라즈마를 이용한 ZnO 박막의 식각 특성

우종창; 김관하; 김경태; 김종규; 강찬민; 김창일

ArticleIssue Date2007Citation전기학회논문지ABCD, v.56, no.3, pp 566 - 570Publisher대한전기학회
Etch characteristics of HfO2 thin films by using CF4/Ar inductively coupled plasma

Kang, Pil-Seung; Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2013CitationVACUUM, v.93, pp 50 - 55PublisherPERGAMON-ELSEVIER SCIENCE LTD
A study of the surface reaction on the etched ITO thin films by using inductively coupled plasma

Kim, Han-Soo; Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2013CitationVACUUM, v.93, pp 7 - 12PublisherPERGAMON-ELSEVIER SCIENCE LTD
Etching characteristics and mechanism of Au thin films in inductively coupled Cl2/Ar plasma

Efremov, AM; Kim, DP; Kim, CI

ArticleIssue Date2003CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.21, no.6, pp 1837 - 1842PublisherA V S AMER INST PHYSICS
Effect of the gas mixing ratio on the plasma parameters and the gas phase composition in Cl-2/CF4 inductively coupled plasmas

Efremov, AM; Kim, DP; Kim, CI

ArticleIssue Date2003CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.43, no.6, pp 1042 - 1048PublisherKOREAN PHYSICAL SOC
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