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SCIESCOPUS
A strategy for wafer-scale crystalline MoS2 thin films with controlled morphology using pulsed metal-organic chemical vapor deposition at low temperatureGo to Link

Choi, Jeong-Hun; Ha, Min-Ji; Park, Jae Chan; Park, Tae Joo; Kim, Woo-Hee; Lee, Myoung-Jae; Ahn, Ji-Hoon

ArticleIssue Date2022CitationAdvanced Materials Interfaces, v.9, no.4, pp 1 - 11PublisherJohn Wiley and Sons Ltd
SCIESCOPUS
Effect of the H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition: Applications for Next-Generation InterconnectsGo to Link

Ha, Min-Ji; Kang, Na-Gyeong; Chung, Eun-Su; Ahn, Ji-Hoon

ArticleIssue Date2025CitationACS APPLIED NANO MATERIALS, v.8, no.25, pp 13130 - 13138PublisherAMER CHEMICAL SOC
SCIESCOPUS
https://pubs.aip.org/avs/jva/article/42/4/042401/3299373/Low-resistivity-molybdenum-carbide-thin-filmsGo to Link

Ha, Min-Ji; Kang, Na-Gyeong; Kim, Woo-Hee; Park,Tae Joo; Park, Tae-Eon; Ahn, Ji-Hoon

ArticleIssue Date2024CitationJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, v.42, no.4, pp 1 - 8PublisherAVS Science and Technology Society
SCIESCOPUS
Low-Temperature Growth of 2D-MoS2 Thin Films by Plasma-Enhanced Atomic Layer Deposition Using a New Molybdenum Precursor and Applicability to Gas SensorsGo to Link

Choi, Jeong-Hun; Ha, Min-Ji; Kim, Dong Geun; Lee, Ji-Min; Ahn, Ji-Hoon

ArticleIssue Date2023CitationACS Applied Nano Materials, v.6, no.13, pp 12132 - 12139PublisherAmerican Chemical Society
SCIESCOPUS
Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based PrecursorGo to Link

Ha, Min-Ji; Kim, Hyunchang; Choi, Jeong-Hun; Kim, Miso; Kim, Woo-Hee; Park, Tae Joo; Shong, Bonggeun; Ahn, Ji-Hoon

ArticleIssue Date2022CitationChemistry of Materials, v.34, no.6, pp 2576 - 2584PublisherAmerican Chemical Society
SCIESCOPUS
Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition: Process Pressure Effect on Initial Growth Behavior of Ru FilmsGo to Link

Kang, Na-Gyeong; Ha, Min-Ji; Ahn, Ji-Hoon

ArticleIssue Date2024CitationChemistry of Materials, v.36, no.17, pp 8496 - 8503PublisherAmerican Chemical Society
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